Two Level Factorial Designs Analysis

Question Description

I’m working on a applied mathematics multi-part question and need an explanation and answer to help me learn.

An article in the AT&T Technical Journal (March/April1986, Vol. 65, pp. 39-50) describes the application of two-level factorial designs to integrated circuit manufacturing. A basic processing step is to grow an epitaxial layer on polished silicon wafers. The wafers mounted on a susceptor are positioned inside a bell jar, and chemical vapors are introduced. The susceptor is rotated and heat is applied until the epitaxial layer is thick enough. An experiment was run using two factors: arsenic flow rate (A) and deposition time (8). Four replicates were run, and the epitaxial layer thickness was measured (in ,microns). The data are shown attached.

(a) Estimate the factor effects.
(b) Conduct the analysis of variance. Which factors are important?
(c) Analyze the residuals. Are there any residuals that should cause concern?
(d) Discuss how you might deal with the potential outlier found in part (c).

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